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Thermophoretic control of building units in the plasma-assisted deposition of nanostructured carbon films
Author(s) -
P.P. Rutkevych,
Kostya Ostrikov,
Sai Xu,
S. V. Vladimirov
Publication year - 2004
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1791761
Subject(s) - nanoparticle , carbon fibers , deposition (geology) , plasma , materials science , carbon nanoparticles , chemical engineering , nanostructure , nanotechnology , substrate (aquarium) , carbon film , thin film , composite material , paleontology , oceanography , physics , quantum mechanics , sediment , geology , composite number , engineering , biology
The role of the plasma-grown nanoparticles in the plasma-enhanced chemical vapor deposition (PECVD) of the nanostructured carbon-based films was investigated. The samples were grown in the low-pressure rf plasmas of CH 4+H2+Ar gas mixtures. The enhanced deposition of the building units from the gas phase was found to support the formation of polymorphous nanostructured carbon films. The results reveal the crucial role played by the thermophoretic force in controlling the deposition of the plasma-grown fine particles

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