Quartz micromachining using laser plasma soft x raysand ultraviolet laser light
Author(s) -
Tetsuya Makimura,
Shinjo Mitani,
Youichi Kenmotsu,
Kouichi Murakami,
Michiaki Mori,
Kiminori Kondo
Publication year - 2004
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1782265
Subject(s) - laser , materials science , irradiation , ultraviolet , opacity , surface micromachining , optics , quartz , optoelectronics , ultraviolet light , plasma , x ray laser , laser power scaling , fabrication , composite material , medicine , physics , alternative medicine , pathology , quantum mechanics , nuclear physics
We have investigated a technique for micromachining inorganic transparent materials. In the technique, patterning and coloration are performed by the direct irradiation of materials with pulsed laser soft x rays and the patterned areas are ablated using ultraviolet laser light. The technique utilizes the high precision of the soft x rays and the high energy density of conventional laser light. For demonstration, we irradiated quartz plates with Ta laser plasma soft x rays. This results in generation of transient surface opaque layers that absorb more than 40% of the 266 nm Nd:YAG laser light. Applying the technique, quartz plates are found to be ablated smoothly at 85 nm/shots
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