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Neutron transmutation doped far-infrared p-Ge laser
Author(s) -
E. W. Nelson,
M. V. Dolguikh,
A. V. Muravjov,
Elena Flitsiyan,
Todd W. Du Bosq,
R. E. Peale,
S. H. Kleckley,
C. J. Fredricksen,
W.G. Vernetson
Publication year - 2004
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1753659
Subject(s) - germanium , doping , laser , materials science , lasing threshold , impurity , crystal (programming language) , acceptor , optoelectronics , neutron , analytical chemistry (journal) , optics , chemistry , silicon , condensed matter physics , physics , nuclear physics , wavelength , chromatography , organic chemistry , computer science , programming language
A far-infrared p-type germanium laser with active crystal prepared from ultra pure single-crystal Ge by neutron transmutation doping (NTD) is demonstrated. Calculations show that the high uniformity of Ga acceptor distribution achieved by NTD significantly improves average gain. The stronger ionized impurity scattering due to high compensation in NTD Ge is shown to have insignificant negative impact on the gain at the moderate doping concentrations sufficient for laser operation. Experimentally, this first NTD laser is found to have lower current-density lasing threshold than the best of a number of melt-doped laser crystals studied for comparison.

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