Open AccessErratum: Hillocks, Pits, and Etch Rate in Germanium Crystals
Author(s) -
B. W. Batterman
Publication year - 1958
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1723085
Subject(s) - hillock , germanium , materials science , etch pit density , germanium compounds , crystallography , optoelectronics , nanotechnology , chemistry , composite material , etching (microfabrication) , silicon , layer (electronics)
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