Open AccessEscape Depth for Excited Photoelectrons in KBr Films
Author(s) -
W. Pong
Publication year - 1967
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1709091
Subject(s) - photoelectric effect , excited state , materials science , optoelectronics , atomic physics , optics , physics
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