z-logo
open-access-imgOpen Access
A Reply to Comments on the Paper ``Potential Distribution and Negative Resistance in Thin Oxide Films''
Author(s) -
T. W. Hickmott
Publication year - 1966
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1708626
Subject(s) - thin film , materials science , oxide , resistance (ecology) , nanotechnology , condensed matter physics , physics , metallurgy , biology , ecology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom