Three-terminal Si-based negative differential resistance circuit element with adjustable peak-to-valley current ratios using a monolithic vertical integration
Author(s) -
Sung-Yong Chung,
Niu Jin,
Paul R. Berger,
Ronghua Yu,
Philip E. Thompson,
Roger K. Lake,
S.L. Rommel,
Santosh K. Kurinec
Publication year - 2004
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1690109
Subject(s) - heterojunction bipolar transistor , bipolar junction transistor , optoelectronics , materials science , common emitter , diode , transistor , heterojunction , current (fluid) , substrate (aquarium) , silicon , integrated circuit , heterostructure emitter bipolar transistor , current injection technique , electrical engineering , voltage , engineering , oceanography , geology
Si-based resonant bipolar transistors are demonstrated by the monolithic vertical integration of Si-based resonant interband tunnel diodes atop the emitter of Si/SiGe heterojunction bipolar transistors ~HBTs! on a silicon substrate. In the common emitter configuration, IC versus VCE shows negative differential resistance characteristics. The resulting characteristics are adjustable peak-to-valley current ratios, including infinite and negative values, and tailorable peak current densities by the control of the HBT base current under room temperature operation. With the integrated RITD-HBT combination, latching properties which are the key operating principle for high-speed mixed-signal, memory, and logic circuitry, are experimentally demonstrated. ? 2004 American Institute of Physics. @DOI: 10.1063/1.1690109#
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