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Erratum: “Two-dimensional terahertz photonic crystals fabricated by deep reactive ion etching in Si” [Appl. Phys. Lett. 83, 21 (2003)]
Author(s) -
Nathan Jukam,
Mark S. Sherwin
Publication year - 2004
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1675925
Subject(s) - terahertz radiation , reactive ion etching , etching (microfabrication) , materials science , optoelectronics , photonics , ion , photonic crystal , condensed matter physics , nanotechnology , physics , quantum mechanics , layer (electronics)

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