Open AccessErratum: Electromigration in Thin Al Films
Author(s) -
I. A. Blech,
Eugene S. Meieran
Publication year - 1972
Publication title -
journal of applied physics
Language(s) - Italian
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1661204
Subject(s) - electromigration , materials science , thin film , metallurgy , composite material , nanotechnology
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