Discharge asymmetry induced by the pulsed radio-frequency current
Author(s) -
H. C. Kim,
J. K. Lee,
J. W. Shon
Publication year - 2004
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1646458
Subject(s) - asymmetry , duty cycle , plasma , current (fluid) , radio frequency , atomic physics , amplitude , materials science , phase (matter) , biasing , ion , voltage , physics , optics , electrical engineering , nuclear physics , quantum mechanics , thermodynamics , engineering
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