Comment on “Formation of nanocrystallites governed by the initial stress in the ultrathin hydrogenated amorphous silicon films” [J. Appl. Phys. 90, 1067 (2001)]
Author(s) -
Brent A. Sperling,
John R. Abelson
Publication year - 2004
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1644628
Subject(s) - amorphous silicon , ellipsometry , paracrystalline , silicon , materials science , amorphous solid , thin film , nanocrystalline silicon , condensed matter physics , chemical engineering , nanotechnology , crystallography , optoelectronics , crystalline silicon , chemistry , physics , engineering
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