Using Direct Solid Sampling ICP-MS to Complement SEM-EDX and SIMS in Characterizing Semiconductor Materials | Zendy

Fuhe Li | Zendy

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Using Direct Solid Sampling ICP-MS to Complement SEM-EDX and SIMS in Characterizing Semiconductor Materials

Author(s) -

Fuhe Li

Publication year - 2003

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.1622550

Subject(s) - laser ablation , materials science , semiconductor , laser , nanotechnology , electronics , inductively coupled plasma mass spectrometry , plasma , analytical chemistry (journal) , optoelectronics , mass spectrometry , chemistry , optics , engineering , electrical engineering , physics , environmental chemistry , chromatography , quantum mechanics

The coupling of laser ablation systems with inductively coupled plasma (ICP) mass spectrometry has been done for many years, however the quantitative aspects as well as the applications have often been limited. Recently, LA ICP-MS has been developed into a valuable analytical tool in our laboratory to address new applications, and some experimental difficulties encountered by SEM -EDX and SIMS in characterizin g solid semiconductor, electronic, and optical communication materials. In this paper we will discuss many of the applications as well as the pros, cons, and complimentary features of the laser ablation technique as it relates to electronics industry issues.

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