The Structural Evolution of Pore Formation in Low-k Dielectric Thin Films | Zendy

Michael S. Silverstein | Zendy

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The Structural Evolution of Pore Formation in Low-k Dielectric Thin Films

Author(s) -

Michael S. Silverstein

Publication year - 2003

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.1622530

Subject(s) - materials science , porosity , specular reflection , radius , dielectric , small angle neutron scattering , scattering , neutron scattering , composite material , optics , optoelectronics , physics , computer security , computer science

Specular x‐ray reflectivity and small angle neutron scattering were used to characterize changes in the porosity, pore size and pore size distribution on processing a polymeric low‐k material filled with 21.6 volume percent of a deuterated porogen with an average radius of 56 A. Processing yielded a decrease in porosity to about 11 %, an increase in average pore radius to 83 A, and a narrower pore size distribution. A sample with an unusual pore structure could be easily identified.

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