Open AccessMonitoring Sheath Voltages and Ion Energies in High-Density Plasmas Using Noninvasive Radio-Frequency Current and Voltage Measurements
Author(s) -
Mark A. Sobolewski
Publication year - 2003
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1622471
Subject(s) - materials science , ion , plasma , radio frequency , voltage , wafer , inductively coupled plasma , argon , plasma processing , waveform , atomic physics , capacitive sensing , energy (signal processing) , debye sheath , biasing , optoelectronics , physics , electrical engineering , computer science , telecommunications , quantum mechanics , engineering
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