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Semiconductor Technology & Manufacturing Status, Challenges, and Solutions — A New Paradigm in the Making
Author(s) -
C. R. Helms
Publication year - 2003
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1622453
Subject(s) - lithography , extreme ultraviolet lithography , revenue , semiconductor device fabrication , profitability index , emerging technologies , semiconductor industry , computer science , engineering physics , nanotechnology , telecommunications , semiconductor , manufacturing engineering , electrical engineering , materials science , engineering , business , optoelectronics , finance , wafer , accounting
The phenomenal growth of the semiconductor industry has been made possible by our ability to deliver more functionality at a lower and lower cost, with a reduction in cost per function of approximately 25% per year. Technology advancements have also enabled higher performance, lower operating voltages, and associated lower power consumption. Dimensional shrinks based on 248 nm lithography led the revolution in recent years. However, with the fundamental limit for optical lithography at about 1/3rd the wavelength, the limits for 193 nm and 157 nm lithography are about 65 nm and 50 nm respectively. With EUV and most other NGL technologies 7 years in the future the limit for the remainder of the decade is about 50 nm. Technology challenges, whether they are lithographic in nature or based on needed new materials with advanced properties, are summarized in this paper along with suggestions for potential solutions for the remainder of the decade. Even if we meet the technology challenges, continued revenue gro...

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