Ordered structure and twin boundary of triblock copolymer/silica mesophase thin films | Zendy

Chi Won Ahn | Zendy; Th. Rasing | Zendy; Mahn Won Kim | Zendy

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Ordered structure and twin boundary of triblock copolymer/silica mesophase thin films

Author(s) -

Chi Won Ahn,

Th. Rasing,

Mahn Won Kim

Publication year - 2003

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.1622433

Subject(s) - mesophase , copolymer , materials science , thin film , transmission electron microscopy , silicon , micelle , chemical engineering , composite material , crystallography , polymer chemistry , liquid crystal , nanotechnology , organic chemistry , polymer , chemistry , aqueous solution , optoelectronics , engineering , metallurgy

We have observed a twin boundary in a triblock copolymer/silica mesophase thin film, produced by spinning an acidic water-ethanol-tetraethoxysilane solution of a triblock copolymer on a hydrophilic treated silicon substrate. The highly ordered structure of the mesophase thin film is formed by ordering of self-assembled triblock copolymer micelles and was characterized with x-ray reflectivity and transmission electron microscopy. The mesophase thin film consists of a face-centered-cubic lattice and the orientation of the film surface is the {111} plane. Furthermore, a {111} twin plane is observed in the mesophase thin film.

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