Open AccessErratum: “X-ray analysis of temperature induced defect structures in boron implanted silicon” [J. Appl. Phys. 92, 3694 (2002)]
Author(s) -
Michael Sztucki,
T. H. Metzger,
I. Kegel,
A. Tilke,
JeanLuc Rouvière,
D. Lübbert,
John Arthur,
J. R. Patel
Publication year - 2003
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1622119
Subject(s) - boron , silicon , materials science , boro , analytical chemistry (journal) , condensed matter physics , crystallography , physics , metallurgy , chemistry , nuclear physics , chromatography
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