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Multiconfigurational self-consistent field study of the silicon carbide (001) surface
Author(s) -
Hiroyuki Tamura,
Mark S. Gordon
Publication year - 2003
Publication title -
the journal of chemical physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.071
H-Index - 357
eISSN - 1089-7690
pISSN - 0021-9606
DOI - 10.1063/1.1617973
Subject(s) - dimer , diradical , materials science , diamond , silicon carbide , crystallography , bond length , silicon , bent molecular geometry , condensed matter physics , chemistry , atomic physics , crystal structure , composite material , optoelectronics , physics , organic chemistry , singlet state , excited state
Multiconfigurational self-consistent field calculations have been performed to investigate structural and electronic properties of cubic silicon carbide (001) (SiC (001)) surfaces. The dimer on silicon-terminated SiC (001) (Si–SiC (001)) is found to be diradical in nature, due to destabilization of the π bond by bending the dimer. Since the SiC lattice constant is larger than that of diamond, the >C=C< dimer on the carbon-terminated SiC (001) (C–SiC (001)) surface is flatter and its π bond is stronger than those on diamond (001). The bridging dimer on the C–SiC (001) exhibits relatively small multiconfigurational character despite its bent geometry. H2 adsorption onto the Si–SiC (001) diradical dimer is more favorable than that onto the partial π bonded Si (001) dimer. As the dimer geometry becomes flatter, the π bond becomes stronger and the H2 adsorption on the dimer becomes less favorable.

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