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Mutual passivation of group IV donors and nitrogen in diluted GaNxAs1−x alloys
Author(s) -
K. M. Yu,
W. Walukiewicz,
Junqiao Wu,
W. Shan,
J. W. Beeman,
Michael A. Scarpulla,
O. D. Dubón,
M. C. Ridgway,
D. E. Mars,
D. R. Chamberlin
Publication year - 2003
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1616980
Subject(s) - passivation , alloy , annealing (glass) , materials science , doping , ion implantation , nitrogen , ion , semiconductor , silicon , metallurgy , optoelectronics , chemistry , nanotechnology , layer (electronics) , organic chemistry
This work was supported by the Director, Office of Science, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, U.S. Department of Energy, under Contract No. DE-AC03-76SF00098. One of the authors ~M.A.S.! acknowledges support by an NSF graduate research fellowship.

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