Open AccessErratum: “Effect of N incorporation on boron penetration from p+ polycrystalline-Si through HfSixOy films” [Appl. Phys. Lett. 82, 4669 (2003)]
Author(s) -
Manuel Quevedo-López,
M. El-Bouanani,
M. J. Kim,
Bruce E. Gnade,
Robert M. Wallace,
M. R. Visokay,
A. Li-Fatou,
J. J. Chambers,
Luigi Colombo
Publication year - 2003
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1606888
Subject(s) - boron , crystallite , penetration (warfare) , materials science , condensed matter physics , crystallography , physics , chemistry , metallurgy , nuclear physics , mathematics , operations research
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