Antiferromagnetic interlayer exchange coupling across epitaxial, Ge-containing spacers
Author(s) -
Р. Р. Гареев,
Daniel E. Bürgler,
R. Schreiber,
H. Braak,
M. Büchmeier,
P. Grünberg
Publication year - 2003
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1606102
Subject(s) - antiferromagnetism , materials science , condensed matter physics , epitaxy , ferromagnetism , coupling (piping) , kerr effect , antiparallel (mathematics) , scattering , brillouin zone , optics , nanotechnology , layer (electronics) , physics , composite material , magnetic field , nonlinear system , quantum mechanics
We give experimental evidence of antiferromagnetic interlayer exchange coupling of Fe(001) layers across epitaxial, Ge-containing spacers consisting of either Ge wedges embedded between two Si boundary layers or Si-Ge-multilayers. The coupling strengths are of the order of 1 mJ/m(2) and decay on a length scale below 2 Angstrom as determined from magneto-optic Kerr effect and Brillouin light scattering. The coupling evolves with the spacer thickness from ferromagnetic to prevailing 90degrees or antiferromagnetic for Ge wedges and Si-Ge multilayers, respectively. The bilinear coupling is comparable in both cases, but the biquadratic contribution is suppressed for Si-Ge-multilayer spacers. Thus, Si-Ge-multilayer spacers give rise to perfect antiparallel alignment of the Fe film magnetizations. (C) 2003 American Institute of Physics
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