Strain-induced growth of SiO2 dots by liquid phase deposition
Author(s) -
C. W. Liu,
B.-C. Hsu,
K. F. Chen,
M. H. Lee,
C.-R. Shie,
Pang-Shiu Chen
Publication year - 2003
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1542682
Subject(s) - materials science , wetting layer , wetting , deposition (geology) , silicon , layer (electronics) , nucleation , silicon dioxide , phase (matter) , responsivity , quantum dot , oxide , optoelectronics , composite material , nanotechnology , photodetector , metallurgy , chemistry , paleontology , organic chemistry , sediment , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom