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Analysis of electron transfer between electron irradiated metallic ball and insulators in vacuum: A specific alternative to the mirror method
Author(s) -
C. Guerret-Piécourt,
D. Juvé,
Noël Burais,
D. Tréheux
Publication year - 2002
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1522477
Subject(s) - dielectric , electron , insulator (electricity) , materials science , sapphire , scanning electron microscope , capacitance , ball (mathematics) , electron microscope , cathode ray , condensed matter physics , atomic physics , optics , chemistry , optoelectronics , composite material , physics , electrode , laser , mathematics , quantum mechanics , mathematical analysis
In order to improve the knowledge of dielectric properties of insulators, we have imagined an original method of characterization of the charge buildup. Electrons of an electron beam are implanted through a metallic ball directly in contact with the insulator in a scanning electron microscope. By calculating and modeling the capacitance and the electrostatic force between the ball and the insulator plane, it has been possible to determine the relationship between the injected charges in the metallic ball and its surface potential. The major role of the dielectric thickness has been evidenced when the insulator is placed on a grounded metallic plane. At high potential values, a dielectric breakdown of the medium surrounding the sphere occurs and electrical charges are transferred from the ball to the dielectric sample. This transfer has been evidenced and quantified in the case of sapphire and quartz. Analytical calculations and numerical simulations using the finite-element method have been performed for interpreting these experimental results

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