Open AccessErratum: “Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures” [J. Appl. Phys. 92, 82 (2002)]
Author(s) -
Susanne Stemmer,
Zhiqiang Chen,
Ralf Keding,
JonPaul Maria,
Dwi Wicaksana,
Angus I. Kingon
Publication year - 2002
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1519098
Subject(s) - annealing (glass) , materials science , oxygen , partial pressure , stability (learning theory) , condensed matter physics , thermodynamics , chemistry , metallurgy , physics , computer science , organic chemistry , machine learning
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