Open AccessX-ray diffuse scattering study of the kinetics of stacking fault growth and annihilation in boron-implanted silicon
Author(s) -
D. Luebbert,
John Arthur,
Michael Sztucki,
T. H. Metzger,
Peter B. Griffin,
J. R. Patel
Publication year - 2002
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1516239
Subject(s) - silicon , boron , stacking fault , materials science , scattering , stacking , dislocation , kinetics , crystallography , molecular physics , condensed matter physics , optoelectronics , chemistry , optics , nuclear physics , composite material , nuclear magnetic resonance , physics , quantum mechanics
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