Tunable photonic strength in porous GaP
Author(s) -
Jaime Gómez Rivas,
Ad Lagendijk,
R.W. Tjerkstra,
Daniël Vanmaekelbergh,
John J. Kelly
Publication year - 2002
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1485316
Subject(s) - gallium phosphide , materials science , etching (microfabrication) , photonics , optoelectronics , dopant , porosity , light scattering , photonic crystal , porous medium , semiconductor , absorption (acoustics) , scattering , doping , optics , nanotechnology , composite material , physics , layer (electronics)
The light-scattering properties of porous gallium phosphide, prepared by electrochemical etching, are investigated. We show that the photonic strength of the porous semiconductor can be tuned from weak to extremely strong. This tunability is related to the density and size of the pores, which are controlled by the dopant density of the GaP crystals, and the etching potential. Moreover, electrochemical etching does not introduce any significant optical absorption, which makes porous GaP suitable for many photonic applications.
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