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Modulated plasma potentials and cross field diffusion in a Helicon plasma
Author(s) -
Andrew Perry,
G. D. Conway,
Rod Boswell,
H. Persing
Publication year - 2002
Publication title -
physics of plasmas
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.75
H-Index - 160
eISSN - 1089-7674
pISSN - 1070-664X
DOI - 10.1063/1.1483845
Subject(s) - helicon , physics , atomic physics , plasma , capacitive coupling , capacitive sensing , diffusion , amplitude , modulation (music) , ion , plasma diagnostics , large helical device , voltage , optics , electrical engineering , quantum mechanics , acoustics , thermodynamics , engineering
As the input rf power to a helicon plasma is increased there is a discontinuous increase in the density which is identified with a change from a capacitive to an inductive/wave coupling to the plasma. The radial distribution of the density is much narrower in the inductive (high) mode than in the capacitive (low) mode. Although the time average plasma potential (Vp) decreases markedly at this mode change, the radial profile of Vp is flat in both modes. Measurements with an emissive probe show that in the capacitive mode Vp is strongly modulated (ΔV is order of Vp) at the rf drive frequency indicating the presence of large rf fields in the source. There is also a large radial gradient in the amplitude of this modulation. In the inductive mode the modulation decreases significantly but can still be observed in measurements of the ion energy distribution. It is suggested that in the capacitive mode, the radial diffusion of electrons is driven by the large gradients in the rf fields. As the density increases,...

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