High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction | Zendy

Nobumichi Tamura | Zendy; Alastair A. MacDowell | Zendy; Richard Celestre | Zendy; H. A. Padmore | Zendy; B. C. Valek | Zendy; J. C. Bravman | Zendy; Ralph Spolenak | Zendy; W. L. Brown | Zendy; T. Marieb | Zendy; H. Fujimoto | Zendy; B. W. Batterman | Zendy; J. R. Patel | Zendy

Open Access

High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction

Author(s) -

Nobumichi Tamura,

Alastair A. MacDowell,

Richard Celestre,

H. A. Padmore,

B. C. Valek,

J. C. Bravman,

Ralph Spolenak,

W. L. Brown,

T. Marieb,

H. Fujimoto,

B. W. Batterman,

J. R. Patel

Publication year - 2002

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.1477621

Subject(s) - achromatic lens , materials science , synchrotron radiation , synchrotron , optics , thin film , image resolution , crystallite , microstructure , diffraction , x ray crystallography , optoelectronics , nanotechnology , composite material , physics , metallurgy

The availability of high brilliance synchrotron sources, coupled with recent progress in achromatic focusing optics and large area 2D detector technology, have allowed us to develop an X-ray synchrotron technique capable of mapping orientation and strain/stress in polycrystalline thin films with submicron spatial resolution. To demonstrate the capabilities of this instrument, we have employed it to study the microstructure of aluminum thin film structures at the granular and subgranular level. Owing to the relatively low absorption of X-rays in materials, this technique can be used to study passivated samples, an important advantage over most electron probes given the very different mechanical behavior of buried and unpassivated materials

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