Open AccessIon beam etching of lead–zirconate–titanate thin films: Correlation between etching parameters and electrical properties evolution
Author(s) -
Caroline Soyer,
Éric Cattan,
Denis Rémiens,
Maryline GuillouxViry
Publication year - 2002
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1476970
Subject(s) - materials science , etching (microfabrication) , lead zirconate titanate , analytical chemistry (journal) , composite material , dry etching , ferroelectricity , acceleration voltage , current density , reactive ion etching , surface roughness , dielectric , optoelectronics , layer (electronics) , chemistry , physics , chromatography , quantum mechanics , cathode ray , electron
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