Erratum: “Ion-channeling analysis of boron clusters in silicon” [J. Appl. Phys. 90, 4741 (2001)]
Author(s) -
Lena Selen,
Frank Janssen,
L.J. van IJzendoorn,
M.J.A. de Voigt,
M. J. J. Theunissen,
P.J.M. Smulders,
T. J. Eijkemans
Publication year - 2002
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1463446
Subject(s) - boron , silicon , ion , boro , atomic physics , materials science , physics , crystallography , molecular physics , chemistry , nuclear physics , metallurgy , quantum mechanics
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