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Collisional and radiative processes in high-pressure discharge plasmas
Author(s) -
Kurt Becker,
P. Kurunczi,
Karl H. Schoenbach
Publication year - 2002
Publication title -
physics of plasmas
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.75
H-Index - 160
eISSN - 1089-7674
pISSN - 1070-664X
DOI - 10.1063/1.1449464
Subject(s) - plasma , physics , atomic physics , radiative transfer , gas discharge lamp , excited state , sputtering , ultraviolet , cathode , optoelectronics , optics , nuclear physics , electrode , chemistry , thin film , quantum mechanics
Discharge plasmas at high pressures (up to and exceeding atmospheric pressure), where single collision conditions no longer prevail, provide a fertile environment for the experimental study of collisions and radiative processes dominated by (i) step-wise processes, i.e., the excitation of an already excited atomic/molecular state and by (ii) three-body collisions leading, for instance, to the formation of excimers. The dominance of collisional and radiative processes beyond binary collisions involving ground-state atoms and molecules in such environments allows for many interesting applications of high-pressure plasmas such as high power lasers, opening switches, novel plasma processing applications and sputtering, absorbers and reflectors for electromagnetic waves, remediation of pollutants and waste streams, and excimer lamps and other noncoherent vacuum-ultraviolet light sources. Here recent progress is summarized in the use of hollow cathode discharge devices with hole dimensions in the range 0.1–0.5 mm for the generation of vacuum-ultraviolet light.

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