Erratum: “Epitaxial growth of orientation-controlled KNbO3 crystal films on MgO using KTaxNb1−xO3 intermediate layer by metalorganic chemical vapor deposition” [Appl. Phys. Lett. 78, 49 (2001)]
Author(s) -
Atsushi Onoe,
Ayako Yoshida,
Kiyofumi Chikuma
Publication year - 2001
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1396621
Subject(s) - chemical vapor deposition , epitaxy , layer (electronics) , materials science , deposition (geology) , crystal (programming language) , crystal growth , combustion chemical vapor deposition , metalorganic vapour phase epitaxy , chemical engineering , thin film , chemistry , crystallography , optoelectronics , nanotechnology , carbon film , geology , paleontology , sediment , computer science , engineering , programming language
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