Open AccessImpact of gas heating in inductively coupled plasmas
Author(s) -
David Hash,
D.K. Bose,
M. V. V. S. Rao,
Brett A. Cruden,
M. Meyyappan,
S. P. Sharma
Publication year - 2001
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1390503
Subject(s) - plasma , langmuir probe , inductively coupled plasma , electron temperature , plasma diagnostics , chemistry , coupling (piping) , plasma parameters , electron density , atomic physics , plasma processing , analytical chemistry (journal) , materials science , nuclear physics , physics , chromatography , metallurgy
Recently it has been recognized that the neutral gas in inductively coupled plasma reactors heats up significantly during processing. The resulting gas density variations across the reactor affect reaction rates, radical densities, plasma characteristics, and uniformity within the reactor. A self-consistent model that couples the plasma generation and transport to the gas flow and heating has been developed and used to study CF4 discharges. A Langmuir probe has been used to measure radial profiles of electron density and temperature. The model predictions agree well with the experimental results. As a result of these comparisons along with the poorer performance of the model without the gas–plasma coupling, the importance of gas heating in plasma processing has been verified.
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