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Selective adsorption and patterning of Si nanoparticles fabricated by laser ablation on functionalized self-assembled monolayer
Author(s) -
Kenji Hata,
M. Fujita,
Shoji Yoshida,
Satoshi Yasuda,
Tetsuya Makimura,
K. Murakami,
Hidemi Shigekawa,
Wataru Mizutani,
Hiroshi Tokumoto
Publication year - 2001
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1388025
Subject(s) - monolayer , adsorption , nanoparticle , laser ablation , substrate (aquarium) , laser ablation synthesis in solution , materials science , selectivity , self assembled monolayer , nanotechnology , chemical engineering , silicon , self assembly , selective adsorption , chemistry , laser , optoelectronics , organic chemistry , catalysis , laser power scaling , optics , physics , oceanography , engineering , x ray laser , geology
We demonstrate an in situ selective adsorption of Si nanoparticles fabricated by laser ablation on a functionalized self-assembled monolayer (SAM). Si nanoparticles adsorbed on –CH3 terminated a SAM while Si particles did not adsorb on –NH2, –F, –OH, and –COOH, terminated SAMs. The end group of a SAM solely determines the selectivity against Si nanoparticle adsorption. We utilized the screening ability of functionalized SAMs to pattern Si nanoparticles onto desired locations on a Si substrate

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