Adjustable ultraviolet-sensitive detectors based on amorphous silicon
Author(s) -
Marko Topič,
H. Stiebig,
Mathias J. Krause,
Heribert Wagner
Publication year - 2001
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1365948
Subject(s) - materials science , amorphous silicon , optoelectronics , amorphous solid , ultraviolet , silicon , wavelength , diode , silicon carbide , thin film , detector , optics , layer (electronics) , crystalline silicon , nanotechnology , chemistry , crystallography , composite material , physics
Thin-film detectors made of hydrogenated amorphous silicon (a-Si:H) and amorphous silicon carbide (a-SiC:H) with adjustable sensitivity in the ultraviolet (UV) spectrum were developed. Thin PIN diodes deposited on glass substrates in N–I–P layer sequence with a total thickness of down to 33 nm and a semitransparent Ag front contact were fabricated. The optimized diodes with a 10 nm Ag contact exhibit spectral response values above 80 mA/W in the wavelength range from 295 to 395 nm with a maximum of 91 mA/W at 320 nm. For longer wavelengths, the spectral response drops by 50% at 450 nm. Increasing the thickness of the Ag front contact leads to a narrowing of the spectral response at around 320 nm, which allows the adjustment from a broad UV to a selective UV–B-sensitive detector.
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