Open AccessCluster primary ion beam secondary ion mass spectrometry for semiconductor characterization
Author(s) -
Greg Gillen
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354477
Subject(s) - secondary ion mass spectrometry , sputtering , ion beam deposition , ion beam , silicon , materials science , static secondary ion mass spectrometry , ion , photoresist , mass spectrometry , polyatomic ion , semiconductor , cluster (spacecraft) , analytical chemistry (journal) , optoelectronics , thin film , chemistry , nanotechnology , organic chemistry , layer (electronics) , chromatography , computer science , programming language
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