Open AccessFeasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Author(s) -
Jean-Philippe Piel
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354452
Subject(s) - metrology , wafer , repeatability , calibration , computer science , dimensional metrology , surface roughness , materials science , surface finish , process (computing) , ellipsometry , process engineering , nanotechnology , mechanical engineering , optics , engineering , thin film , physics , chemistry , chromatography , quantum mechanics , composite material , operating system
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