Spectroscopic ellipsometry from the vacuum ultraviolet to the far infrared

Spectroscopic ellipsometry is an important thin film metrology technique. It offers non-destructive and non-invasive materials characterization, including measurement of the complex refractive index and other microstructural properties that affect the material optical response. It has been applied to many important ultra large scale integration (ULSI) thin-film metrology needs; as it is applicable to semiconductors, dielectrics, metals, organic films, and more. Recent advances have broadened the impact of ellipsometry for many applications. New instruments are extending the spectral range to both shorter and longer wavelengths. High-speed spectroscopic measurements can be accomplished with diode-array technology. In addition to hardware advances, new data analysis techniques have extended the capabilities of spectroscopic ellipsometry. The advanced capabilities of spectroscopic ellipsometry will be reviewed, including the importance of new spectral ranges in the vacuum ultra-violet (VUV) and infrared (IR)...