Open AccessNew developments in deep ultraviolet laser metrology for photolithography
Author(s) -
M. L. Dowell
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354425
Subject(s) - metrology , calibration , laser , photolithography , ultraviolet , materials science , characterization (materials science) , measurement uncertainty , extreme ultraviolet lithography , power (physics) , optics , energy (signal processing) , optoelectronics , laser power scaling , current (fluid) , computer science , engineering physics , electrical engineering , nanotechnology , physics , engineering , quantum mechanics
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