Open AccessPEEM imaging and modeling of dopant-concentration variation in Si devices
Author(s) -
V. W. Ballarotto
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354416
Subject(s) - dopant , materials science , doping , photoemission electron microscopy , optoelectronics , silicon , optics , electron microscope , physics
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