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Development of an in-line X-ray reflectivity technique for metal film thickness measurement
Author(s) -
Donald Windover
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354405
Subject(s) - materials science , microelectronics , thin film , x ray reflectivity , reflectivity , copper , optics , tantalum , reflection (computer programming) , energy (signal processing) , optoelectronics , metallurgy , computer science , nanotechnology , physics , quantum mechanics , programming language

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