Characterizing interfacial roughness by light scattering ellipsometry
Author(s) -
Thomas A. Germer
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354395
Subject(s) - materials science , scattering , surface finish , wafer , surface roughness , silicon , light scattering , ellipsometry , polarization (electrochemistry) , optics , dielectric , optoelectronics , thin film , composite material , nanotechnology , physics , chemistry
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