z-logo
open-access-imgOpen Access
Optical and electrical thickness measurements of alternate gate dielectrics: A fundamental difference
Author(s) -
Curt A. Richter
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354385
Subject(s) - dielectric , materials science , gate dielectric , permittivity , characterization (materials science) , optoelectronics , interferometry , metrology , dielectric permittivity , optics , transistor , voltage , electrical engineering , nanotechnology , physics , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom