Open AccessProduct wafer measurements of MOS gate dielectric quality with a small diameter elastic probe
Author(s) -
Robert Hillard
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354382
Subject(s) - wafer , materials science , gate oxide , gate dielectric , optoelectronics , dielectric , metrology , leakage (economics) , threshold voltage , electronic engineering , voltage , electrical engineering , optics , engineering , transistor , physics , economics , macroeconomics
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