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Impact of the ITRS Metrology Roadmap
Author(s) -
Alain C. Diebold
Publication year - 2001
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.1354374
Subject(s) - technology roadmap , metrology , semiconductor industry , lithography , semiconductor device fabrication , integrated circuit , technology forecasting , process (computing) , engineering , interconnection , systems engineering , computer science , manufacturing engineering , electrical engineering , materials science , telecommunications , wafer , physics , business , optoelectronics , marketing , artificial intelligence , optics , operating system
The International Technology Roadmap for Semiconductors (ITRS) provides the semiconductor industry with the timing of critical technology needs for future generations of integrated circuits. The Metrology roadmap in the ITRS describes the measurement needs based on the process requirements found in the Lithography, Front End Processes, Interconnect, and Packaging Roadmaps. This paper illustrates the impact of the Metrology Roadmap on the development of key measurement technology.

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