Open AccessThe dynamic competition between stress generation and relaxation mechanisms during coalescence of Volmer–Weber thin films
Author(s) -
J. A. Floro,
Sean Hearne,
John Hunter,
Paul G. Kotula,
Eric Chason,
Steven C. Seel,
Carl V. Thompson
Publication year - 2001
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1352563
Subject(s) - materials science , stress relaxation , relaxation (psychology) , thin film , amorphous solid , ultimate tensile strength , stress (linguistics) , coalescence (physics) , crystallite , composite material , chemical physics , metallurgy , creep , crystallography , nanotechnology , chemistry , psychology , social psychology , physics , astrobiology , linguistics , philosophy
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