Strain relaxation and segregation effects during self-assembled InAs quantum dots formation on GaAs(001)
Author(s) -
J. M. Garcı́a,
J. P. Silveira,
F. Briones
Publication year - 2000
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.126992
Subject(s) - quantum dot , monolayer , materials science , stress relaxation , relaxation (psychology) , gallium arsenide , strain (injury) , condensed matter physics , self assembly , surface energy , photoluminescence , optoelectronics , nanotechnology , chemical physics , chemistry , physics , composite material , medicine , psychology , social psychology , creep
3 pages, 2 figures.-- PACS: 81.05.Ea; 68.35.Dv;\ud68.55.Jk; 68.60.BsIn segregation effects during InAs growth on GaAs(001) and critical thickness for InAs self-assembled quantum dots are studied using a real time, in situ technique capable of measuring accumulated stress during growth. Due to a large (~50%) surface In segregation of floating In, self-assembled dot formation takes place when less than one monolayer of InAs is pseudomorphically grown on GaAs. A picture of the growth process is discussed on the basis of the equilibrium between InAs and floating In dominated by the stress energy.Peer reviewe
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