Minority carrier diffusion, defects, and localization in InGaAsN, with 2% nitrogen
Author(s) -
S. R. Kurtz,
Andrew A. Allerman,
C. H. Seager,
R. M. Sieg,
E. D. Jones
Publication year - 2000
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.126989
Subject(s) - photoconductivity , electron mobility , materials science , diffusion , doping , condensed matter physics , hall effect , enhanced data rates for gsm evolution , carrier lifetime , electron , mean free path , semiconductor , optoelectronics , electrical resistivity and conductivity , silicon , physics , telecommunications , quantum mechanics , computer science , thermodynamics
Electron and hole transport in compensated, InGaAsN ({approx} 2% N) are examined through Hall mobility, photoconductivity, and solar cell photoresponse measurements. Short minority carrier diffusion lengths, photoconductive-response spectra, and doping dependent, thermally activated Hall mobilities reveal a broad distribution of localized states. At this stage of development, lateral carrier transport appears to be limited by large scale (>> mean free path) material inhomogeneities, not a random alloy-induced mobility edge
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