Open AccessSecond-harmonic generation from realistic film–substrate interfaces: The effects of strain
Author(s) -
I. L. Lyubchanskiĭ,
N. N. Dadoenkova,
M. I. Lyubchanskii,
Th. Rasing,
Jaewoo Jeong,
SungChul Shin
Publication year - 2000
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.126188
Subject(s) - materials science , second harmonic generation , condensed matter physics , thin film , polarization (electrochemistry) , optics , surface second harmonic generation , dislocation , scattering , nonlinear optics , nonlinear system , lattice (music) , strain (injury) , physics , chemistry , composite material , nanotechnology , quantum mechanics , medicine , laser , acoustics
The optical second-harmonic generation from a thin crystalline film on a substrate is theoretically investigated for both s and p polarized incident light. The contributions of lattice misfit strain as well as of misfit dislocation strain to the second-order nonlinear optical susceptibility are described using a nonlinear photoelastic tensor and can be separated by a polarization analysis of the scattered light at the second harmonic frequency. For the s(v)!s(2v) and p(v)!s(2v) scattering geometries, the nonlinear optical signal will be determined by dislocation strain only, whereas for the s(v)! p(2v) and p(v)! p(2v) geometries both lattice misfit strain and misfit dislocation strain will contribute. © 2000 American Institute of Physics.@S0003-6951~00!01814-3#
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