Local structures of free-standing AlxGa1−xN thin films studied by extended x-ray absorption fine structure | Zendy

K. M. Yu | Zendy; W. Shan | Zendy; C. J. Glover | Zendy; M. C. Ridgway | Zendy; William S. Wong | Zendy; Wei Yang | Zendy

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Local structures of free-standing AlxGa1−xN thin films studied by extended x-ray absorption fine structure

Author(s) -

K. M. Yu,

W. Shan,

C. J. Glover,

M. C. Ridgway,

William S. Wong,

Wei Yang

Publication year - 1999

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.125548

Subject(s) - bond length , extended x ray absorption fine structure , crystallography , electron shell , absorption spectroscopy , bond strength , materials science , absorption (acoustics) , alloy , chemistry , molecular geometry , composition (language) , analytical chemistry (journal) , crystal structure , ion , molecule , optics , nanotechnology , metallurgy , physics , ionization , philosophy , adhesive , linguistics , composite material , layer (electronics) , chromatography , organic chemistry

This work was supported by the Director, Office of Science, Of- fice of Basic Energy Sciences, Materials Science Division of the U.S. Department of Energy under Contract No. DE-AC03-76SF00098. The LLO work was performed at the UC Berkeley Integrated Materials Laboratory which was supported in part by the National Science Foundation. C.J.G. and M.C.R. were supported by the Australian Synchrotron Research Program, funded by the Commonwealth of Australia via the Major National Research Facilities Program. SSRL was supported by the Office of Basic Energy Sciences of the U.S. Department of Energy.

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